Электронный каталог

Статья

Pham, T.T.T.
Effect of Ion Bombardment on the Chemical and the Mechanical Properties of Silicon-Nitride Thin Films Deposited by Using PECVD with SiH&sub(4)/NH&sub(3)/Ar Gases at Low Temperature / T.T.T.Pham, [et al.] // Journal of the Korean Physical Society. – 2007. – Vol.51, No.6. – p.1934-1939. – Bibliogr.:21.



Спец.(статьи,препринты) = С 349.1 - Действие излучения на материалы$