Электронный каталог

Статья

Liang, J.H.
Dependence of Implantation Sequence on Surface Blistering Characteristics Due to H and He Ions Co-Implanted in Silicon / J.H.Liang, [et al.] // Nuclear Instruments & Methods in Physics Research B. – 2015. – Vol.365, Pt.A. – p.128-132. – URL: http://dx.doi.org/10.1016/j.nimb.2015.07.059. – Bibliogr.:21.



Спец.(статьи,препринты) = С 349.1 - Действие излучения на материалы$