Поиск :
Личный кабинет :
Электронный каталог: Kim, K.-S. - Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor D...
Kim, K.-S. - Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor D...
Статья
Автор: Kim, K.-S.
Journal of the Korean Physical Society: Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor D...
б.г.
ISBN отсутствует
Автор: Kim, K.-S.
Journal of the Korean Physical Society: Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor D...
б.г.
ISBN отсутствует
Статья
Kim, K.-S.
Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor Deposition with Single-Precursor Hexamethyldisilane for Different In-Situ-Doping Concentrations / K.-S.Kim, G.-S.Chung // Journal of the Korean Physical Society. – 2011. – Vol.59, No.2. – p.285-288. – URL: http://dx.doi.org/10.3938/jkps.59.285. – Bibliogr.:18.
Спец.(статьи,препринты) = С 344.4б - Методы приготовления тонких пленок$
Kim, K.-S.
Characteristics of Anodized Polycrystalline 3C-SiC Thin Films Deposited by Using Chemical Vapor Deposition with Single-Precursor Hexamethyldisilane for Different In-Situ-Doping Concentrations / K.-S.Kim, G.-S.Chung // Journal of the Korean Physical Society. – 2011. – Vol.59, No.2. – p.285-288. – URL: http://dx.doi.org/10.3938/jkps.59.285. – Bibliogr.:18.
Спец.(статьи,препринты) = С 344.4б - Методы приготовления тонких пленок$