Электронный каталог

Статья

Kryukov, Y.A.
Experimental and Theoretical Study of the Evolution of Surface Roughness in Amorphous Silicon Films Grown by Low-Temperature Plasma-Enhanced Chemical Vapor Deposition / Y.A.Kryukov, [a.o.] // Physical Review B : Condensed Matter and Materials Physics. – 2009. – Vol.80, No.8. – p.085403. – URL: http://dx.doi.org/10.1103/PhysRevB.80.085403. – Bibliogr.:27.



Спец.(статьи,препринты) = С 353 - Физика плазмы