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Электронный каталог: Chen, W. - Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memo...
Chen, W. - Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memo...
Статья
Автор: Chen, W.
IEEE Transactions on Nuclear Science: Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memo...
б.г.
ISBN отсутствует
Автор: Chen, W.
IEEE Transactions on Nuclear Science: Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memo...
б.г.
ISBN отсутствует
Статья
Chen, W.
Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memory and Selectors / W.Chen, [et al.] // IEEE Transactions on Nuclear Science. – 2017. – Vol.64, No.1, Pt.1. – p.269-270. – URL: https://doi.org/10.1109/TNS.2016.2618359. – Bibliogr.:33.
Спец.(статьи,препринты) = С 349.1 - Действие излучения на материалы$
Chen, W.
Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memory and Selectors / W.Chen, [et al.] // IEEE Transactions on Nuclear Science. – 2017. – Vol.64, No.1, Pt.1. – p.269-270. – URL: https://doi.org/10.1109/TNS.2016.2618359. – Bibliogr.:33.
Спец.(статьи,препринты) = С 349.1 - Действие излучения на материалы$