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Электронный каталог: Chang, Z.-C. - Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering
Chang, Z.-C. - Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering
Статья
Автор: Chang, Z.-C.
Nuclear Instruments & Methods in Physics Research B: Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering
б.г.
ISBN отсутствует
Автор: Chang, Z.-C.
Nuclear Instruments & Methods in Physics Research B: Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering
б.г.
ISBN отсутствует
Статья
Chang, Z.-C.
Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering / Z.-C.Chang, [a.o.] // Nuclear Instruments & Methods in Physics Research B : Beam Interactins with Materials and Atoms. – 2010. – Vol.268, No.16. – p.2504-2509. – URL: http://dx.doi.org/10.1016/j.nimb.2010.05.039. – Bibliogr.:25.
Спец.(статьи,препринты) = С 344.4б - Методы приготовления тонких пленок$
Chang, Z.-C.
Characteristics of TiVCrAlZr Multi-Element Nitride Films Prepared by Reactive Sputtering / Z.-C.Chang, [a.o.] // Nuclear Instruments & Methods in Physics Research B : Beam Interactins with Materials and Atoms. – 2010. – Vol.268, No.16. – p.2504-2509. – URL: http://dx.doi.org/10.1016/j.nimb.2010.05.039. – Bibliogr.:25.
Спец.(статьи,препринты) = С 344.4б - Методы приготовления тонких пленок$